Research

Research Interests

• Research and development of new CMP slurries and Post-CMP cleaning solutions for copper, tungsten, cobalt, oxide, STI, and barrier metal layers.
• Colloidal Chemistry and Electrochemistry
• Nanoparticle synthesis and dispersion
• Particle adhesion and removal
• Atomic force microscopy & Evanescent Wave Microscopy

Chemical Mechanical Planarization