CAMP is excited to host the 27th International Symposium on Chemical-Mechanical Planarization (CMP)!
The meeting will be held July 27 – 30, 2025, in Saratoga Springs, NY. Saratoga Springs is a beautiful upstate NY town only 45 mins drive from Albany International airport.
Chemical-mechanical planarization (CMP) has come to occupy a central role in many industrially important technologies, especially in semiconductor manufacturing. The 25th International Symposium on CMP, hosted by Clarkson University’s Center for Advanced Materials Processing (CAMP) in conjunction with the US CMP Users Group, is the leading forum to hear leading-edge ideas and technologies relating to CMP along with ample time to network with colleagues in the CMP field.
We will have an exciting line-up of speakers, keynotes, and plenaries – please check this website regularly for updates!
Please reach out to Leila Boyea at the CAMP office (lboyea@clarkson.edu), CAMP Director Devon Shipp (dshipp@clarkson.edu), or CAMP Business Development Director Eric Xu (ericxu@clarkson.edu) if you have questions.
About Saratoga Springs:
Saratoga Springs is in picturesque upstate New York and has a lot of things to see and do. The Adirondack Mountains are only a short drive away and Saratoga Springs is internationally known for its horse racing.
Check out more about Saratoga Springs here.
Other Symposium Information:
Information regarding registration, hotel, travel, and symposium speakers will be posted here in early 2025.
Find out more about CAMP at our main website: https://www.clarkson.edu/academics/research/labs-centers/camp
Find out more NYSTAR’s Centers of Advanced Technologies (CATs): https://esd.ny.gov/doing-business-ny/centers-advanced-technology
