{"id":10,"date":"2021-05-28T12:13:42","date_gmt":"2021-05-28T12:13:42","guid":{"rendered":"https:\/\/dev-cu-sites.pantheonsite.io\/jseo\/?page_id=10"},"modified":"2025-09-17T14:43:05","modified_gmt":"2025-09-17T14:43:05","slug":"publications","status":"publish","type":"page","link":"https:\/\/sites.clarkson.edu\/jseo\/publications\/","title":{"rendered":"Publications"},"content":{"rendered":"\n

Peer-reviewed Publications<\/h2>\n\n\n\n

(62 papers, 4 book chapters, 24 patents)<\/h3>\n\n\n\n

Submitted<\/h3>\n\n\n\n

65. S. Ryu<\/strong>, C. Larson<\/strong>, P.J. Kim, J. Choi, K. Lee*, and\u00a0J. Seo*<\/u><\/strong> Mechanism of Surface Passivation by Sulfur-Containing Amino Acids in Corrosion Inhibition of Molybdenum in Chemical Mechanical Planarization,\u00a0Submitted<\/em>.<\/p>\n\n\n\n

64. A. Khanmohammadi*, G. Ahmadi, S. Krishnan, A. Sadrimofakham<\/strong>, R. Muralidaran, C. Lim, D. Kwon, B. Kim, and J. Seo<\/strong>, A Model for Electric Field-Assisted and Flow-Induced Ceria Nanoparticle Removal with Applications to Post-CMP Cleaning, Submitted<\/em>.<\/p>\n\n\n\n

63. Atomic-Level Insights and Machine Learning for Rational Corrosion Inhibitor Design in Copper CMP, Submitted<\/em>.<\/p>\n\n\n\n

2025<\/h3>\n\n\n\n

62. S. Lee, S. Yang, M. Kang, Y. Bae, K. Lee, Y. Jung, Y. Kim, J. Kim, K. Roh, J. Seo<\/strong>, S. Cho, J. Choi, T. Kim, P.J. Kim, Boosting Electrochemical Stability and Reversibility in Anode-Free Lithium Metal Batteries via Lithiatable Supporter Incorporation in Current Collectors, NPJ Flexible Electronics, Accepted<\/em>. <\/p>\n\n\n\n

61. S. Ryu<\/strong>, M. Ramu<\/strong>, P. J. Kim, J. Choi, K. Lee, J. Seo*<\/strong>, Review on Atomistic and Quantum Mechanical Simulation Approaches in Chemical Mechanical Planarization, Applied Surface Science Advances, 2025.<\/p>\n\n\n\n

60. R. Venkataswamy<\/strong>, M. Ramu<\/strong>, J. Seo*<\/strong>, Toward Eco-Friendly CMP Process: Emerging Trends and Strategies for Reducing Environmental Footprint, Environmental Science & Technology Letters<\/a>, 2025. (Journal Cover)<\/strong><\/p>\n\n\n\n

59. S. Yang, S. Lee, M. Kang, K. Roh, J. Seo<\/u><\/strong>, D. Lee, K. Kim, S. Lee, S. Cho, P.J. Kim*, J. Choi*, Insights into improving Li-ion Transference Number and Li Deposition Uniformity toward High-Current-Density Lithium Metal Anode, Carbon Energy, 2025, Accepted. (Journal Cover)<\/strong><\/p>\n\n\n\n

58. S. Lee, D. Lee, J. Kang, S. Yang, M. Kang, W. Jo, J. Seo<\/strong>, S. Cho, P.J. Kim, J. Choi, Anode SHIELD: A Surface Hybrid Interlayer for High\u2010Capacity Anodes Toward Safe and Stable Lithium\u2010Ion Batteries, Advanced Functional Materials<\/a>, 2025, e13744. (Journal Cover)<\/strong><\/p>\n\n\n\n

57. H. Seo, S. Ryu<\/strong>, J. Seo<\/strong>, P.J. Kim, J. Yoo*, Boosting Selenium Cathode Performance through Kinetic Optimization, Journal of Power Sources<\/a>, 2025, 645, 237122.<\/p>\n\n\n\n

56. H. Tran<\/strong>, M. Moinpour, A. Rawat, E. J. Podlaha, and J. Seo*<\/strong>, Dynamic Electrochemical Behavior of Cu and Co in Amino Acid-Based Slurries for Chemical Mechanical Planarization, Surfaces and Interfaces<\/a>, 2025, 65, 106529.<\/p>\n\n\n\n

55. S. Ryu<\/strong>, M. Moinpour, A. Rawat, P. Kim, E. J. Podlaha, and J. Seo*<\/strong>, Molecular Interactions of Amino Acids for Corrosion Control in Molybdenum CMP Through Bridging Experimental Insights and DFT Simulations, Applied Surface Science<\/a>, 2025, 698, 163046.<\/p>\n\n\n\n

54. C. Jani, R. Venkataswamy<\/strong><\/strong>, J. Seo<\/strong>, and S. Krishnan*, Revisiting the Roles of Chelator, Inhibitor, Oxidant, and Abrasive in High-Rate Copper CMP, ECS Journal of Solid State Science and Technology<\/a>, 2025, 14, 044003.<\/p>\n\n\n\n

53. Y. Terayama*, P. Khajornrungruang*, J. Seo<\/strong>, H. Satomi, Y. Wada, H. Hiyama, Direct Observation of Sub-100 nm Silica Particle Detachment: Lateral Force and Evanescent Microscope study, ECS Journal of Solid State Science and Technology<\/a>, 2025, 14, 044004.<\/p>\n\n\n\n

52. H. Tran<\/strong>, E. J. Podlaha, and J. Seo*<\/strong>, Green Chemistry in CMP Through a Comparison of Amino Acid Degradability and Environmental Impact with Benzotriazole in Advanced Oxidation Processes, Journal of Environmental Chemical Engineering<\/a>, 2024, 115134.<\/p>\n\n\n\n

2024<\/h3>\n\n\n\n

51. A. S. Mofakham<\/strong>, H. Kim, H. Cho, K. Lee, G. Ahmadi, J. Seo*<\/strong>, Enhancing CMP Performance through Micro-Structured Pad Patterns: Insights from CFD Simulations and Experimental Evaluations, ECS Journal of Solid State Science and Technology<\/a>, 2024.<\/p>\n\n\n\n

50. R. Venkataswamy, L. Trimble, S. Ryu, N. Le, K. Park, H. Kang, J. Seo*<\/strong>, Atomic-Level Insights into CeO2 Performance: Chemical Interactions in CMP Explored through CeO2-SiO2 Studies, Ceramic Internationals<\/a>, 2024.<\/p>\n\n\n\n

49. Y. Terayama*, P. Khajornrungruang, K. Suzuki, J. Seo<\/strong>, H. Satomi, Y. Wada, H. Hiyama, Detachment Energy Evaluation in the Nano-particle Cleaning by using Lateral Force Microscopy, Applied Sciences<\/a>, 2024, 14 (18) 8145.<\/p>\n\n\n\n

48. H. Tran, J. Guchovi, J. Commane, E. J. Podlaha, J. Seo*<\/strong>, Examining Amino Acids as Environmentally Friendly Corrosion Inhibitors for Cu and Co Chemical Mechanical Planarization, Journal of Environmental Chemical Engineering<\/a>, 2024, 113669.<\/p>\n\n\n\n

47. V-T. Nguyen, J. Wait, T. Nishi, S. Hamada, H. Himaya, and J. Seo*<\/strong>, Systematic Root Cause Analysis of Ceria-Induced Defects during Chemical Mechanical Planarization and Cleaning, Journal of Manufacturing Processes<\/a>, 2024, 127, 15, 27-34.<\/p>\n\n\n\n

46. S. Choi, J. Yim, J. Lim, S. Kim, Y. Jeong, K. Bae, J. Seo<\/strong>, <\/em>K. Lee, Tailored electrostatic attraction force between anionic polymer and Si3N4 film in consecutive gate poly open CMP, Materials Science in Semiconductor Processing<\/a>, 2024, 184, 108761.<\/p>\n\n\n\n

45. R. Venkataswamy, L. Trimble, A. McDonald, D. Nevers, L. V. Bengochea, A. Carswell, A. Rossner*, J. Seo*,<\/strong> Environmental Impact Assessment of Chemical Mechanical Planarization Consumables: Challenges, Future Needs, and Perspectives, ACS Sustainable Chemistry & Engineering<\/a>, 2024. (Review Paper) (Journal Cover)<\/strong><\/p>\n\n\n\n

44. S. Park, J. Seo*<\/strong>, Comparative First-Principles Analysis of Crystalline vs. Amorphous CeO2 Particles: Implications for Chemical Mechanical Planarization, Journal of Materials Science<\/a>, 2024, 59, 11405-11415.<\/p>\n\n\n\n

43. M. Park, S. Woo, J. Seo<\/strong>, J. Choi, E. Jeong, P.J. Kim, Directing the uniform and dense Li deposition via graphene-enhanced separators for high-stability Li metal batteries, Electrochemical Acta<\/a>, 2024, 495, 144426.<\/p>\n\n\n\n

42. A. Othman+, A. Gowda+, D. Andreescu, M. Hassan, S. Babu, J. Seo<\/strong>*,<\/strong> <\/em>S. Andreescu*, Two decades of ceria nanoparticles research: structure, properties and emerging applications, Materials Horizons<\/a>, 2024. (Review Paper)<\/p>\n\n\n\n

41. A. Venkataronappa, J. Bankaitis, J. Seo*<\/strong>, Enhancing Dispersion Stability and Recyclability of Ceria Slurry with Polyacrylic Acid for Improved Glass Polishing Performance, Journal of Industrial and Engineering Chemistry<\/a>, 2024.<\/p>\n\n\n\n

40. J. Seo<\/strong>, S. Ryu, J. Kwon, K. Lee*, Structural Dependency of Pyridine Carboxylic Acid Isomers in Metal-Organic Coordination Adsorption, Applied Surface Science<\/a>, 2024, 663, 160149.<\/p>\n\n\n\n

39. J. Seo<\/strong>, J. Hur, S. Kim, Y. Kim, Y. Kim, K. Bae, K. Lee, and G. An, Recovery and Reuse of Magnetic Silica-Coated Iron Oxide Particles for Eco-Friendly Chemical Mechanical Planarization, Colloids and Surfaces A: Physicochemical and Engineering Aspects<\/a>, 2024, 694, 134064.<\/p>\n\n\n\n

38. M. Liu, B. Zhang*, J. Seo*,<\/strong> W. Xian, D. Cui, P. Wu, Y. Wang, S. Liu, Development of Highly Stable Ceria Slurry in Acetic Acid-Ammonium Acetate Buffer System for Effective Silica Chemical Mechanical Planarization, Materials Science in Semiconductor Processing<\/a>, 2024, 108411.<\/p>\n\n\n\n

37. D. Lee+, S. Lee+, D. Jung, K. Roh, J. Seo<\/strong>, J. Kim, K. Kim, P.J. Kim, J. Choi<\/em>, Synergistically Enhanced LiF-rich Protective Layer for Highly Stable Silicon Anodes, Applied Surface Science<\/a>, 2024, 160023.<\/p>\n\n\n\n

36. A. Othman, H. Kim, R. Trivedi, T. Kulasingam, J. Seo*<\/strong>, Understanding and Mitigating Temperature-Induced Agglomeration in Silica-based Chemical Mechanical Planarization (CMP) Slurry Storage, Colloids and Surfaces A: Physicochemical and Engineering Aspects<\/a>, 2024,133802.<\/p>\n\n\n\n

35. K. Kwon, J. Kim, S. Han, J. Lee, J. Kwon, J. Lee, J. Seo<\/strong>, P.J. Kim, T. Song, J. Choi*, Low-Resistance LiFePO4 Thick Film Electrode Processed with Dry Electrode Technology for High-Energy-Density Lithium-Ion Batteries, Small-Science<\/a>, 2024, 2300302. (Journal Cover)<\/strong><\/p>\n\n\n\n

34. S. Yang, J. Kim, S. Lee, J. Seo<\/strong>, J. Choi, P.J. Kim, Uniform Li Deposition through the Graphene-Based Ion-Flux Regulator for High-Rate Li Metal Batteries, ACS Applied Materials & Interfaces<\/a>, 2024, 16, 3, 3416-3426.<\/p>\n\n\n\n

2022<\/h3>\n\n\n\n

33. K. Lee, S. Kim, S. Sun, G. Lee, J. Kwon, J. Hwang, J. Seo<\/strong><\/strong><\/strong>, U. Paik, T. Song, Hydrogenated Ceria Nanoparticles for High-Efficiency Silicate Adsorption, New J. Chem<\/strong><\/em>, 2022.<\/p>\n\n\n\n

32. J. Seo<\/strong><\/strong>*, K. Kim, H. Kang, S.V. Babu, Perspective-Recent advances and perspectives on ceria particle applications in chemical mechanical planarization, ECS Journal of Solid State Science and Technology,<\/em><\/strong><\/em><\/strong><\/em> 2022, 11, 084003. <\/em>(Perspective article)<\/strong><\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

31. C. K. Ranaweera, S.V. Babu, S. Hamada, J. Seo<\/strong><\/strong>*, Measurement of the force required to move ceria particles from SiO2 surfaces using lateral force microscopy, Journal of Materials Research,<\/em><\/strong> 202<\/em>2.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

30. K. Lee, J. Seo<\/strong>, Suppression of Dissolution Rate via Coordination Complex in Tungsten CMP, Applied Sciences,<\/em><\/strong><\/em><\/strong> 2022, 12(3).<\/p>\n\n\n\n

2021 <\/h3>\n\n\n\n

29. J. Seo<\/strong>*, A. Othman, H. J. Kim, J. Devabhaktuni, R. Trivedi, D. Penigalapati, T. Kulasingam, H. Vegi, S. V. Babu, Storage Temperature Effects on the Slurry Health Parameters and SiO2 Removal Rates during Chemical Mechanical Polishing, ECS Journal of Solid State Science and Technology,<\/em><\/strong><\/em><\/strong> 2021, 10, 104002.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

28. C. K. Ranaweera, P. Khajornrungruang, S. Hamada, A. Gowda, H. Vegi, J. Seo<\/strong><\/strong>*,<\/strong> and S.V. Babu, Real-Time Visualization of the Cleaning of Ceria Particles from Silicon Dioxide Films Using PVA Brush Scrubbing, ECS Journal of Solid State Science and Technology,<\/em><\/strong><\/em><\/strong> 2021, 10, 084004.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

27. J. Seo<\/strong>*, A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization, Journal of Materials Research,<\/em><\/strong> 2021, P1-23. (Review article), Early Career Scholars in Material Science<\/strong><\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

2020 <\/h3>\n\n\n\n

26. J. Seo (Corresponding)<\/strong>*,<\/strong> A. Gowda*, P. Khajornrungruang, S. Hamada, and S.V. Babu, 3D Trajectories and Diffusion of Single Ceria Particles near a Glass Surface and their Removal, Journal of Materials Research,<\/em><\/strong> 2020, P1-10. Early Career Scholars in Material Science<\/strong><\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

25. J. Seo (Corresponding)<\/strong>*,<\/strong> A. Gowda*, P. Khajornrungruang, S. Hamada, T. Song, and S.V. Babu, Trajectories, Diffusion, and Interactions of Single Ceria Particles on a Glass Surface Observed by Evanescent Wave Microscopy, Journal of Materials Research,<\/em><\/strong> 2020, 35 (3), P321-331.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

24. A. Gowda, J. Seo<\/strong>, C.K. Ranaweera, S.V. Babu, Cleaning Solutions for Removal of \u223c30 nm Ceria Particles from Proline and Citric Acid Containing Slurries Deposited on Silicon Dioxide and Silicon Nitride Surfaces, ECS Journal of Solid State Science and Technology,<\/em><\/strong> <\/em>2020, 9 (4), 004013.<\/p>\n\n\n\n

2019 <\/h3>\n\n\n\n

23. J. Seo (Corresponding)<\/strong>, S.S.R.K.H. Vegi, S.V. Babu, Post-CMP Cleaning Solutions for the Removal of Organic Contaminants with Reduced Galvanic Corrosion at Copper\/Cobalt Interface for Advanced Cu Interconnect Applications, ECS Journal of Solid State Science and Technology,<\/em><\/strong> 2019, 8 (8), P379-P387.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

22. J. Seo<\/strong>, S.S.R.K.H. Vegi, C.K. Ranaweera, N.K. Baradanahalli, J. Han, D. Koli, S.V. Babu, Formation of Cobalt-BTA Complexes and Their Removal from Various Surfaces Relevant to Cobalt Interconnect Applications, ECS Journal of Solid State Science and Technology,<\/em><\/strong> 2019, 7 (5), P3009-P3017.<\/p>\n\n\n\n

2018 <\/h3>\n\n\n\n

21. J. Seo<\/strong>, A. Gowda, S.V. Babu, Almost Complete Removal of Ceria Particles Down to 10 nm Size from Silicon Dioxide Surfaces, ECS Journal of Solid State Science and Technology,<\/em><\/strong> 2018, 7(5), P23-P252.<\/p>\n\n\n\n

\"Graphic<\/figure>\n\n\n\n

20. C.K. Ranaweera, N.K. Baradanahalli, R. Popuri, J. Seo<\/strong>, S.V. Babu, Ammonium persulfate and potassium oleate containing silica dispersions for chemical mechanical polishing for cobalt interconnect applications, ECS Journal of Solid State Science and Technology,<\/em><\/strong> <\/em>2018, 7 (5), P1-P8.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

19. J. Choi*, J. Kim*, J. Seo<\/strong>, J. Kwon, T. Song, Environmentally-harmless Polylactic Acid-Polyethylene Glycol Binder for Deformable ceramic green body, Ceramics International,<\/em><\/strong> 2018, 44(4), 4220-4224. Front Cover<\/strong><\/span><\/p>\n\n\n\n

2014-2017 (18 papers)<\/h3>\n\n\n\n

18. J. Choi*, J. Kim*, J. Seo*<\/strong>, J. Kwon, T. Song, Toward functional 3D architecture platform: Advanced approach to anchor functional metal oxide onto 3D printed scaffold, Advanced Engineering Materials,<\/em><\/strong> 2017, 1700901. (Front Cover)<\/p>\n\n\n\n

17. K. You*, J. Seo*<\/strong>, T. Song, Control of Tungsten Protrusion with Surface Active Agent during Tungsten Chemical Mechanical Polishing, ECS Journal of Solid State Science and Technology,<\/em> <\/strong>2017, 6(12), P822-P827.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

16. J. Seo<\/strong>, K. You, J. Moon, J. Kim, U. Paik, Corrosion Behavior of Tungsten Metal Gate in the Presence of Hydrogen Peroxide at Acidic Medium, ECS Journal of Solid State Science and Technology,<\/em> <\/strong>2017, 6(4), P169-P171.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

15. J. Seo<\/strong>, J. Kim, M. Lee, K. You, J. Moon, D. Lee, U. Paik, Multi-objective optimization of tungsten CMP slurry for advanced semiconductor manufacturing using a response surface methodology, Materials & Design,<\/em><\/strong> <\/em>2017,117, 131-138.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

14. J. Seo<\/strong>*, J. Moon*, Y. Kim, K. Kim, K. Lee, Y. Cho, D. Lee, U. Paik, Synergistic Effect of Mixed Particle Size on W CMP Process: Optimization using Experimental Design, ECS Journal of Solid State Science and Technology,<\/em><\/strong> <\/em>2017, 6(1), P42-P44.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

13. K. Kim*, K. Lee*, J. Seo<\/strong>, T. Song, Reduction of friction force between ceria and SiO2<\/sub> for low dishing in STI CMP, ECS Journal of Solid State Science and Technology,<\/em> <\/strong>2017, 6 (10), P752-P754.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

12. K. Kim, J. Seo, <\/strong>M. Lee, J. Moon, K. Lee, D. Yi, and U. Paik, Highly dispersed Fe3+<\/sup>-substituted colloidal silica nanoparticles for defect-free tungsten chemical mechanical planarization, ECS Journal of Solid State Science and Technology,<\/em><\/strong> 2017, 6 (7), P405-P409.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

11. K. Kim, J. Seo, <\/strong>M. Lee, J. Moon, K. Lee, D. Yi, and U. Paik, Ce3+<\/sup> enriched core-shell ceria nanoparticle for silicate adsorption, Journal of Materials Research,<\/em><\/strong> 2017, 32 (14), P2829-2836.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

10. J. Kim, J. Seo, <\/strong>K. Fu, J. Choi, J. Kwon, L. Hu, U. Paik, Synergistic Protective Effect of a BN-Carbon-separator for Highly Stable Lithium Sulfur Batteries, NPG Asia Materials,<\/em><\/strong> 2017, 9 (4), e375.<\/p>\n\n\n\n

9. J. Seo<\/strong>, J. Kim, M. Lee, D. Yi, U. Paik, Size dependent interactions of silica nanoparticles with flat silica surface, Journal of Colloid and Interface Science<\/em><\/strong>, 2016, 483, 177-184.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

8. J. Seo<\/strong>*, J. Moon*, J. Kim, K. Lee, J. Hwang, H. Yoon, D. Yi, U. Paik, Role of oxidation state of cerium on the ceria surfaces for silicate adsorption, Applied Surface Science<\/em><\/strong>, 2016, 389, 311-315.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

7. J. Seo<\/strong>, D. Lee, K. Lee, K. Kim, K. Kim, Optimizing a blend of mixture slurry in chemical mechanical planarization for advanced semiconductor manufacturing using a posterior preference articulation approach to dual response surface optimization, Applied Stochastic Models in Business and Industry<\/em><\/strong>, 2016, 32, 648-659.<\/p>\n\n\n\n

6. J. Kim, J. Seo, <\/strong>J. Choi, D. Shin, M. Carter, Y. Jeon, C. Wang, L. Hu, U. Paik, Synergistic Ultra-thin Functional Polymer Coated Carbon Nanotube Interlayer for High performance Lithium Sulfur Batteries, ACS Applied Materials and Interfaces<\/em><\/strong>, 2016, 8, 20092-20099.<\/p>\n\n\n\n

5. J. Kim, J. Choi, J. Seo, <\/strong>J. Kwon, U. Paik, Two-dimensional Nafion nanoweb anion-shield for improved electrochemical performances of lithium-sulfur batteries, Journal of Materials Chemistry A<\/em><\/strong>, 2016, 4, 11203-11206.<\/p>\n\n\n\n

4. J. Seo<\/strong>, J. Moon, S. Moon, U. Paik, Interpolymer complexes of poly (acrylic acid) and poly (ethylene glycol) for low dishing in STI CMP, Applied Surface Science<\/em><\/strong>, 2015, 353, 499-503.<\/p>\n\n\n\n

\"For<\/figure>\n\n\n\n

3. J. Seo<\/strong>*, J. Lee*, J. Moon, W. Sigmund, U. Paik, Role of the surface chemistry of ceria surfaces on silicate adsorption, ACS Applied Materials and Interfaces<\/em><\/strong>, 2014, 6, 7388-7394.<\/p>\n\n\n\n

2. J. Seo<\/strong>*, J. Moon*, J. Bae, K. Yoon, W. Sigmund, U. Paik, Control of adhesion force between ceria particles and polishing pad in shallow trench isolation chemical mechanical planarization, Journal of Nanoscience and Nanotechnology<\/em><\/strong>, 2014, 14, 4351-4356.<\/p>\n\n\n\n

1. J. Seo<\/strong>*, K. Yoon*, J. Moon, K. Kim, W. Sigmund, U. Paik, Effects of physico-chemical properties between poly(ethyleneimine) and silica abrasive on copper chemical mechanical planarization, Microelectronic Engineering<\/em><\/strong>, 2014, 113, 50-54.<\/p>\n\n\n\n

Book Chapters (Invited)<\/h2>\n\n\n\n
    \n
  1. J. Seo,<\/strong> Chapter 18. Challenges and solutions for post-CMP cleaning at device and interconnect levels, in Advances in Chemical Mechanical Planarization (CMP)<\/em> 2nd edition, edited by S.V. Babu (2021).<\/li>\n\n\n\n
  2. K. Lee, J. Seo,<\/strong> U Paik, Chapter 11. Preparation and characterization of slurry for CMP, in Advances in Chemical Mechanical Planarization (CMP)<\/em> 2nd edition, edited by S.V. Babu (2021).<\/li>\n\n\n\n
  3. J. Seo, <\/strong>CMP-related to contaminants: their source and characterization, in Emerging Contaminants,<\/em> edited by Aurel Nuro (2020)<\/li>\n\n\n\n
  4. J. Seo,<\/strong> U Paik, Preparation and characterization of slurry for CMP, Chapter 11 in Advances in Chemical Mechanical Planarization (CMP)<\/em>, edited by Prof. S.V. Babu (2016).<\/li>\n<\/ol>\n\n\n\n

    Patents<\/h2>\n\n\n\n
      \n
    1. Post-CMP cleaning composition, Japan, PCT\/JP2022\/026835 (Pending, 2022\/07\/06)<\/li>\n\n\n\n
    2. Post-CMP cleaning composition, Japan, JP2023009994A (Pending, 2023\/01\/20)<\/li>\n\n\n\n
    3. Post-CMP cleaning composition, Japan, JP2023009993A (Pending, 2023\/01\/20)<\/li>\n\n\n\n
    4. High removal rate oxide film polishing slurry composition, Republic of Korea, 10-2021-0050246 (Granted<\/em><\/strong>, 2021\/07\/14).<\/li>\n\n\n\n
    5. Abrasive particle of core-shell structure, preparing method of the same and polishing slurry composition comprising the same, Republic of Korea, 10-2019-0134621 (Pending, 2019\/10\/28).<\/li>\n\n\n\n
    6. Polishing slurry composition, China, CN106661429B (Granted,<\/em><\/strong> 2019\/07\/05).<\/li>\n\n\n\n
    7. Polishing slurry composition, Taiwan, TWI658133B (Granted,<\/em><\/strong> 2019\/05\/01).<\/li>\n\n\n\n
    8. Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same, USA, 15\/293,816 (Granted,<\/em><\/strong> 2018\/08\/14).<\/li>\n\n\n\n
    9. Slurry comprising for STI polishing, Republic of Korea, 1017617920000 (Granted,<\/em><\/strong> 2017\/07\/20).<\/li>\n\n\n\n
    10. Polishing slurry composition, USA, US20170183537A1 (Pending, 2017\/06\/29).<\/li>\n\n\n\n
    11. Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same, Republic of Korea, 10-2017-0044522 (Pending, 2017\/04\/25).<\/li>\n\n\n\n
    12. Polishing slurry composition, Republic of Korea, 1016820970000 (Granted,<\/em><\/strong> 2016\/11\/28).<\/li>\n\n\n\n
    13. Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same, China, CN106867411A (Pending, 2016\/10\/17).<\/li>\n\n\n\n
    14. Polishing slurry composition, Republic of Korea, 1016603840000 (Granted,<\/em><\/strong> 2016\/09\/21).<\/li>\n\n\n\n
    15. Porous polishing particle and slurry comprising the same, Republic of Korea, 1016558490000 (Granted<\/em>, 2016\/09\/02).<\/li>\n\n\n\n
    16. Nano ceria slurry composition for chemical-mechanical polishing and preparation method for thereof, Republic of Korea, 1016133590000 (Granted,<\/em><\/strong> 2016\/04\/11).<\/li>\n\n\n\n
    17. Polishing slurry and substrate or wafer polishing method using the same, Republic of Korea, 1014067590000 (Granted,<\/em><\/strong> 2014\/06\/05).<\/li>\n\n\n\n
    18. Polishing slurry and substrate or wafer polishing method using the same, Republic of Korea, 1014067600000 (Granted,<\/em><\/strong> 2014\/06\/05).<\/li>\n\n\n\n
    19. Slurry composition and substrate or wafer polishing method using the same, Republic of Korea, 1014067570000 (Granted,<\/em><\/strong> 2014\/06\/05).<\/li>\n\n\n\n
    20. Slurry composition and substrate or wafer polishing method using the same, Republic of Korea, 1014067580000 (Granted,<\/em><\/strong> 2014\/06\/05).<\/li>\n\n\n\n
    21. Polishing slurry composition and substrate or wafer polishing method using the same, Republic of Korea, 1013881060000 (Granted,<\/em><\/strong> 2014\/04\/22).<\/li>\n\n\n\n
    22. Polishing slurry for removal of initial step height and substrate or wafer polishing method using the same, Republic of Korea, 1013962520000 (Granted,<\/em><\/strong> 2014\/05\/12).<\/li>\n\n\n\n
    23. Polishing slurry additive composition and slurry composition including the polishing slurry additive composition, Republic of Korea, 1020130134737 (Granted,<\/em><\/strong> 2013\/11\/07).<\/li>\n\n\n\n
    24. Catalyst slurry, electrode prepared by using the catalyst slurry and fuel cell including the electrode, USA, US 8,512,905 (Granted,<\/em><\/strong> 2013\/08\/20).<\/li>\n<\/ol>\n\n\n\n

      <\/p>\n","protected":false},"excerpt":{"rendered":"

      Peer-reviewed Publications (62 papers, 4 book chapters, 24 patents) Submitted 65. S. Ryu, C. Larson, P.J. Kim, J. Choi, K. Lee*, and\u00a0J. Seo* Mechanism of Surface Passivation by Sulfur-Containing Amino Acids in Corrosion Inhibition of Molybdenum in Chemical Mechanical Planarization,\u00a0Submitted. 64. A. Khanmohammadi*, G. Ahmadi, S. Krishnan, A. Sadrimofakham, R. Muralidaran, C. Lim, D. Kwon, […]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"advgb_blocks_editor_width":"","advgb_blocks_columns_visual_guide":"","footnotes":""},"class_list":["post-10","page","type-page","status-publish","hentry"],"coauthors":[],"author_meta":{"author_link":"https:\/\/sites.clarkson.edu\/jseo\/author\/moeler\/","display_name":"moeler"},"relative_dates":{"created":"Posted 5 years ago","modified":"Updated 7 months ago"},"absolute_dates":{"created":"Posted on May 28, 2021","modified":"Updated on September 17, 2025"},"absolute_dates_time":{"created":"Posted on May 28, 2021 12:13 pm","modified":"Updated on September 17, 2025 2:43 pm"},"featured_img_caption":"","featured_img":false,"series_order":"","_links":{"self":[{"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/pages\/10","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/comments?post=10"}],"version-history":[{"count":24,"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/pages\/10\/revisions"}],"predecessor-version":[{"id":1924,"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/pages\/10\/revisions\/1924"}],"wp:attachment":[{"href":"https:\/\/sites.clarkson.edu\/jseo\/wp-json\/wp\/v2\/media?parent=10"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}